Method of semiconductor integrated circuit fabrication
A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate and depositing a conductive layer on the substrate. A patterned hard mask and a catalyst layer are formed on the conductive layer. The method further includes growing a plurality o...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
17.04.2018
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Subjects | |
Online Access | Get full text |
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