Hard mask composition for spin-coating
Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased a...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
20.02.2018
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!