Hard mask composition for spin-coating
Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased a...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
20.02.2018
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Subjects | |
Online Access | Get full text |
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Summary: | Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness. |
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Bibliography: | Application Number: US201614996481 |