Metal line layout based on line shifting
A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolat...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
20.02.2018
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolated metal line. |
---|---|
AbstractList | A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolated metal line. |
Author | Hassmann Jens Meyer Moritz Andreas Lehr Matthias U Herrmann Thomas Kuncha Rakesh Kumar Melde Thomas |
Author_xml | – fullname: Lehr Matthias U – fullname: Hassmann Jens – fullname: Herrmann Thomas – fullname: Kuncha Rakesh Kumar – fullname: Meyer Moritz Andreas – fullname: Melde Thomas |
BookMark | eNrjYmDJy89L5WTQ8E0tScxRyMnMS1XISazMLy1RSEosTk1RyM-DCBZnZKaVZOal8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSS-NBgSwtLC1NzIycjYyKUAABGYymY |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US9898572B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US9898572B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 16:07:58 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US9898572B23 |
Notes | Application Number: US201615045466 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180220&DB=EPODOC&CC=US&NR=9898572B2 |
ParticipantIDs | epo_espacenet_US9898572B2 |
PublicationCentury | 2000 |
PublicationDate | 20180220 |
PublicationDateYYYYMMDD | 2018-02-20 |
PublicationDate_xml | – month: 02 year: 2018 text: 20180220 day: 20 |
PublicationDecade | 2010 |
PublicationYear | 2018 |
RelatedCompanies | GLOBALFOUNDRIES Inc |
RelatedCompanies_xml | – name: GLOBALFOUNDRIES Inc |
Score | 3.1377654 |
Snippet | A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS |
Title | Metal line layout based on line shifting |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180220&DB=EPODOC&locale=&CC=US&NR=9898572B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR3LSsNAcCj1edOoWF_sQYKXYNvsNs0hCHlRhLTFNtJbyeaBgZIUkyL-vbNrWr3odRZmZwfmufMAuM9Msx9h3KCZMTM0qlOuRcOIacKXZcNuQhOZGgjGg1FInxds0YJ82wsj54R-yOGIKFExynst9fX6J4nlytrK6pHnCCqf_Lnlqk103JONo6prW9504k4c1XGscKaOXyyxJpEZfRu19R560Yao_vJebdGUsv5tUfwT2J8isqI-hVZaKHDkbBevKXAYNP_dChzIAs24QmAjhNUZPARI2ooI_5Csos9yUxNhixJSFt_A6i3PRDXzORDfmzsjDS9f7h66DGc7MvULaGP8n14C0Q0EZgMap0lCedwT64F5pDNOuZ7xPu9A5080V_-cXcOx4Jjsz-7eQLt-36S3aGFrfid58wUMCX8o |
link.rule.ids | 230,309,783,888,25578,76884 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR3LTsJAcELwgTdFjfjcg2m8NEK7S8uhMWkLqUqBSDHcSLeP2IQUYkuMf-_sCuhFr7PJ7Owk89x5ANymnY4WYtygdiJmqFSnXA3NkKnCl2VmM6axTA34g7Y3oU9TNq1AtumFkXNCP-RwRJSoCOW9lPp6-ZPEcmVtZXHPMwQtHnqB5Srr6LglG0cV17a6o6E7dBTHsSZjZfBiiTWJzNBs1NY76GGbYsx-99UWTSnL3xaldwi7I0SWl0dQSfI61JzN4rU67Pvr_-467MkCzahA4FoIi2O485G0ORH-IZmHn4tVSYQtiski_wYWb1kqqplPgPS6geOpePls-9DZZLwlUz-FKsb_yRkQ3UBg2qZREseURy2xHpiHOuOU6ynXeAMaf6I5_-fsBmpe4Pdn_cfB8wUcCO7JXu3mJVTL91Vyhda25NeST18qTYIY |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Metal+line+layout+based+on+line+shifting&rft.inventor=Lehr+Matthias+U&rft.inventor=Hassmann+Jens&rft.inventor=Herrmann+Thomas&rft.inventor=Kuncha+Rakesh+Kumar&rft.inventor=Meyer+Moritz+Andreas&rft.inventor=Melde+Thomas&rft.date=2018-02-20&rft.externalDBID=B2&rft.externalDocID=US9898572B2 |