Metal line layout based on line shifting

A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolat...

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Bibliographic Details
Main Authors Lehr Matthias U, Hassmann Jens, Herrmann Thomas, Kuncha Rakesh Kumar, Meyer Moritz Andreas, Melde Thomas
Format Patent
LanguageEnglish
Published 20.02.2018
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolated metal line.
Bibliography:Application Number: US201615045466