Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate f...

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Bibliographic Details
Main Authors De Jongh Robertus Johannes Marinus, Merkx Leon Leonardus Franciscus, Merry Roel Johannes Elisabeth
Format Patent
LanguageEnglish
Published 02.01.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.
Bibliography:Application Number: US201515303478