Low-moisture cloud-making cleaning article

• Main Authors: Lee WanDuk, Engelbrecht Kathleen C, Bhatt Divesh, Rippl Carl G, Leong Waihong, Baker Andrew T, Soerens Dave A, Koenig David William, Yang Kaiyuan, Feldkamp Joseph R, Heo Jin, Abraham Jose Kollakompil
• Format: Patent
• Language: English
• Published: 28.11.2017
• Subjects: BRAIDING; COFFEE MILLS; COTTON-WOOL; DOMESTIC ARTICLES OR APPLIANCES; DOMESTIC WASHING OR CLEANING; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS,NON-WOVEN FABRICS; FURNITURE; HUMAN NECESSITIES; KNITTING; LACE-MAKING; MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARYMATERIAL; NON-WOVEN FABRICS; SPICE MILLS; SUCTION CLEANERS IN GENERAL; TEXTILES; TRIMMINGS; WADDING

A cleaning article includes a cleaning article sheet comprising a fabric substrate, wherein the fabric substrate includes pores therein, and wherein the fabric substrate has a background moisture percentage by weight, and liquid water disposed substantially and disconnectedly within the pores, wherein the liquid water is at moisture percentage by weight that is 5 to 150 percentage points higher than the background moisture percentage. The nonwoven substrate can include pores formed between and/or within the fibers and can have a background moisture percentage by weight. The substrate can include a treatment to increase the dielectric constant from the dielectric constant of the substrate without the treatment. The moisture of the article can be configured to exhibit a dielectric constant of at least 50% and up to 600% higher than the dielectric constant of the same article with only background moisture.