Extreme ultraviolet light source utilizing a target of finite extent

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the firs...

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Bibliographic Details
Main Authors Tao Yezheng, Stewart, IV John Tom, Brown Daniel, Jur Jordan
Format Patent
LanguageEnglish
Published 21.11.2017
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Bibliography:Application Number: US201615148255