Thru-silicon-via structures

Stress generation free thru-silicon-via structures with improved performance and reliability and methods of manufacture are provided. The method includes forming a first conductive diffusion barrier liner on an insulator layer within a thru-silicon-via of a wafer material. The method further include...

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Bibliographic Details
Main Authors Graas Carole D, Farooq Mukta G, Chen Fen, Liu Xiao Hu
Format Patent
LanguageEnglish
Published 07.11.2017
Subjects
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