Optical element surface alteration to correct wavefront error

Methods and mechanisms for correcting a wavefront error in an optical element are disclosed. A wavefront error that is downstream of an optical element in an optical path is determined. A refractive index prescription that reduces the wavefront error is determined. A beam of energy is directed at a...

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Bibliographic Details
Main Authors Baleine Clara R, Tener Gene D
Format Patent
LanguageEnglish
Published 26.09.2017
Subjects
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Summary:Methods and mechanisms for correcting a wavefront error in an optical element are disclosed. A wavefront error that is downstream of an optical element in an optical path is determined. A refractive index prescription that reduces the wavefront error is determined. A beam of energy is directed at a surface of the optical element in accordance with the refractive index prescription to alter the surface to change an index of refraction at multiple locations on the surface.
Bibliography:Application Number: US201414556517