Method, apparatus and system for tessellating a parametric patch

A method of tessellating a parametric patch (610) of an object is disclosed. A boundary curve associated with the parametric patch (610) is vectorized according to a pre-determined flatness tolerance. A tessellation point associated with a first parametric value inside the parametric patch (610) is...

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Bibliographic Details
Main Authors Soulard Hervé, Liu Jun, Mandal Abhijit, Coker Andrew R
Format Patent
LanguageEnglish
Published 05.09.2017
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Summary:A method of tessellating a parametric patch (610) of an object is disclosed. A boundary curve associated with the parametric patch (610) is vectorized according to a pre-determined flatness tolerance. A tessellation point associated with a first parametric value inside the parametric patch (610) is determined based on geometry of the parametric patch (610) and a tessellation step. A curve associated with the first parametric value is determined based on the geometry of the parametric patch (610) and the tessellation step. A color split point on the vectorized boundary curve is determined. The color split point is determined based on the vectorized boundary curve and the determined curve associated with the first parametric value. The parametric patch (610) is tessellated by joining the color split point and the tessellation point.
Bibliography:Application Number: US201414559409