Positioning apparatus for an electron beam
A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potentia...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
29.08.2017
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potential level, and a deflection module, which has two inputs and at least one deflection coil, wherein the at least one deflection coil is connected between the two inputs of the deflection module. |
---|---|
Bibliography: | Application Number: US201514709068 |