Positioning apparatus for an electron beam

A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potentia...

Full description

Saved in:
Bibliographic Details
Main Authors Berk Jan, Weidinger Thomas
Format Patent
LanguageEnglish
Published 29.08.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potential level, and a deflection module, which has two inputs and at least one deflection coil, wherein the at least one deflection coil is connected between the two inputs of the deflection module.
Bibliography:Application Number: US201514709068