Electron beam plasma source with reduced metal contamination

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

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Bibliographic Details
Main Authors Lane Steven, Rauf Shahid, Carducci James D, Ramaswamy Kartik, Collins Kenneth S, Misra Nipun, Monroy Gonzalo Antonio, Dorf Leonid
Format Patent
LanguageEnglish
Published 01.08.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.
Bibliography:Application Number: US201313912488