Manufacturing method of liquid crystal display

A method for manufacturing a liquid crystal display includes: forming a first passivation layer and an organic layer, forming an edge of an inclined portion of the organic layer by partially removing the organic layer at a location where a first drain contact hole that exposes a drain electrode of a...

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Bibliographic Details
Main Authors Kim Tae Ho, Kim Yu Jun, Kho Young Woon, Park Jong Kyun, Jeong Ji Young, Park Kwang Bae
Format Patent
LanguageEnglish
Published 04.07.2017
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Summary:A method for manufacturing a liquid crystal display includes: forming a first passivation layer and an organic layer, forming an edge of an inclined portion of the organic layer by partially removing the organic layer at a location where a first drain contact hole that exposes a drain electrode of a thin film transistor is formed, forming a second passivation layer including a third drain contact hole exposing the drain electrode, a first electrode including a second drain contact hole exposing the drain electrode, and the first drain contact hole through an etching process using one etching mask, and forming a second electrode on the second passivation layer. The first drain contact hole, the second drain contact hole, and the third drain contact hole overlap with each other, and a size of the second drain contact hole is greater than a size of the third drain contact hole.
Bibliography:Application Number: US201414463108