Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement

• Main Authors: Baer Norman, Loering Ulrich, Gruner Toralf
• Format: Patent
• Language: English
• Published: 06.06.2017
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to an optical arrangement comprising: at least one optical element comprising an optical surface and a substrate, wherein the substrate is formed from a material whose temperature-dependent coefficient of thermal expansion at a zero crossing temperature ΔTZC=TZC−Tref related to a reference temperature Tref is equal to zero, wherein the optical surface has, during the operation of the optical arrangement, a location-dependent temperature distribution ΔT(x, y) that is dependent on a local irradiance (5a), is related to the reference temperature Tref and has an average temperature ΔTav, a minimum temperature ΔTmin and a maximum temperature ΔTmax, wherein the average temperature ΔTav is less than the average value 1/2 (ΔTmax+ΔTmin) formed from the minimum temperature ΔTmin and the maximum temperature ΔTmax, and wherein the zero crossing temperature ΔTZC is greater than the average temperature ΔTav.