Systems and methods for chemical mechanical planarization with photoluminescence quenching
A method includes performing a chemical-mechanical planarization (CMP) on an article, providing a polishing fluid including luminescent particles capable of generating a fluorescent light in response to a light incident on the article, and detecting an intensity of the fluorescent light. An apparatu...
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Main Author | |
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Format | Patent |
Language | English |
Published |
30.05.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A method includes performing a chemical-mechanical planarization (CMP) on an article, providing a polishing fluid including luminescent particles capable of generating a fluorescent light in response to a light incident on the article, and detecting an intensity of the fluorescent light. An apparatus that is capable of performing the method and a system that includes the apparatus are also disclosed. |
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Bibliography: | Application Number: US201514855447 |