Projection exposure method and projection exposure apparatus for microlithography
A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided. The method includes determining at least one light quiver parameter which describes a property of a light quiver, and controlling the operation of the projection expo...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
30.05.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided. The method includes determining at least one light quiver parameter which describes a property of a light quiver, and controlling the operation of the projection exposure apparatus taking account of the light quiver parameter. |
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Bibliography: | Application Number: US201414456819 |