Thermoset polymides for microelectronic applications

Dendrimer/hyperbranched materials are combined with polyimide to form a low CTE material for use as a dielectric substrate layer or an underfill. In the alternative, ruthenium carbene complexes are used to catalyze ROMP cross-linking reactions in polyimides to produce a class of cross-linkable, ther...

Full description

Saved in:
Bibliographic Details
Main Authors Matayabas, Jr. James C, Lehman, Jr. Stephen E, Jayaraman Saikumar
Format Patent
LanguageEnglish
Published 09.05.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Dendrimer/hyperbranched materials are combined with polyimide to form a low CTE material for use as a dielectric substrate layer or an underfill. In the alternative, ruthenium carbene complexes are used to catalyze ROMP cross-linking reactions in polyimides to produce a class of cross-linkable, thermal and mechanical stable material for use as a dielectric substrate or underfill. In another alternative, dendrimers/hyperbranched materials are synthesized by different methods to produce low viscosity, high Tg, fast curing, mechanically and chemically stable materials for imprinting applications.
Bibliography:Application Number: US201414171707