Lithographic apparatus and contamination removal or prevention method

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentra...

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Main Authors Leenders Martinus Hendrikus Antonius, De Jong Anthonius Martinus Cornelis Petrus, Van Der Donck Jacques Cor Johan, Watso Robert Douglas, Jansen Hans, Wanten Peter Franciscus, Van Den Dool Teunis Cornelis, Cromwijk Jan Willem, Van Der Net Antonius Johannus, Schuh Nadja
Format Patent
LanguageEnglish
Published 21.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
AbstractList An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
Author Van Der Net Antonius Johannus
Van Der Donck Jacques Cor Johan
Jansen Hans
Watso Robert Douglas
De Jong Anthonius Martinus Cornelis Petrus
Wanten Peter Franciscus
Van Den Dool Teunis Cornelis
Leenders Martinus Hendrikus Antonius
Schuh Nadja
Cromwijk Jan Willem
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– fullname: Van Der Donck Jacques Cor Johan
– fullname: Watso Robert Douglas
– fullname: Jansen Hans
– fullname: Wanten Peter Franciscus
– fullname: Van Den Dool Teunis Cornelis
– fullname: Cromwijk Jan Willem
– fullname: Van Der Net Antonius Johannus
– fullname: Schuh Nadja
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Snippet An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Lithographic apparatus and contamination removal or prevention method
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