Lithographic apparatus and contamination removal or prevention method

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentra...

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Bibliographic Details
Main Authors Leenders Martinus Hendrikus Antonius, De Jong Anthonius Martinus Cornelis Petrus, Van Der Donck Jacques Cor Johan, Watso Robert Douglas, Jansen Hans, Wanten Peter Franciscus, Van Den Dool Teunis Cornelis, Cromwijk Jan Willem, Van Der Net Antonius Johannus, Schuh Nadja
Format Patent
LanguageEnglish
Published 21.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
Bibliography:Application Number: US201514879852