Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

• Main Authors: Siekmann Heiko, Kierey Holger, Bresan Andre
• Format: Patent
• Language: English
• Published: 10.01.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTROGRAPHY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF; GRINDING; HEATING; HOLOGRAPHY; LIGHTING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS THEREFOR; MECHANICAL ENGINEERING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHING; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR; TRANSPORTING; WEAPONS

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.