Seed crystal for SiC single-crystal growth, SiC single crystal, and method of manufacturing the SiC single crystal

A seed crystal for SiC single-crystal growth includes a facet formation region containing a {0001}-plane uppermost portion and n (n>=3) planes provided enclosing the periphery of the facet formation region. The seed crystal for SiC single-crystal growth satisfies the relationships represented by...

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Bibliographic Details
Main Authors Shigetoh Keisuke, Urakami Yasushi, Matsuse Akihiro, Gunjishima Itaru
Format Patent
LanguageEnglish
Published 03.01.2017
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Summary:A seed crystal for SiC single-crystal growth includes a facet formation region containing a {0001}-plane uppermost portion and n (n>=3) planes provided enclosing the periphery of the facet formation region. The seed crystal for SiC single-crystal growth satisfies the relationships represented by formula (a): Bkk-1<=cos−1(sin(2.3 degrees)/sin Ck), formula (b): Bkk<=cos−1(sin(2.3 degrees)/sin Ck), and formula (c): min(Ck)<=20 degrees. In the formulas, Ck is an offset angle of a k-th plane, Bkk-1 is an angle defined by an offset downstream direction of the k-th plane and a (k−1)-th ridge line, and Bkk is an angle defined by the offset downstream direction of the k-th plane and a k-th ridge line.
Bibliography:Application Number: US201314435335