Lithographic apparatus and device manufacturing method

• Main Authors: Simon Klaus, Ritsema Roelof Aeilko Siebrand, Loopstra Erik Roelof, Meijer Hendricus Johannes Maria, Sengers Timotheus Franciscus, Bijlaart Erik Theodorus Maria, Lof Joeri, Hoogendam Christiaan Alexander, Streefkerk Bob, Straaijer Alexander, Mertens Jeroen Johannes Sophia Maria, Mulkens Johannes Catharinus Hubertus, Donders Sjoerd Nicolaas Lambertus, De Smit Joannes Theodoor
• Format: Patent
• Language: English
• Published: 01.11.2016
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.