Contact hole collimation using etch-resistant walls

Contact holes are constrained to their designated active areas by etch-resistant walls so that they cannot contact adjacent active areas. Etch-resistant walls provide outer limits for any contact hole bending that may occur and thus keep contact holes substantially vertical. Mask openings for contac...

Full description

Saved in:
Bibliographic Details
Main Authors Tobita Hirotada, Kumamoto Keita, Futase Takuya, Yamada Katsuo, Kakegawa Tomoyasu
Format Patent
LanguageEnglish
Published 11.10.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Contact holes are constrained to their designated active areas by etch-resistant walls so that they cannot contact adjacent active areas. Etch-resistant walls provide outer limits for any contact hole bending that may occur and thus keep contact holes substantially vertical. Mask openings for contact hole formation may be large so that they overlap etch-resistant walls.
Bibliography:Application Number: US201414445703