Semiconductor device and method for making the device
Disclosed herein is a semiconductor device including: a first substrate provided with a first surface layer including a first electrode; an expanded second substrate provided with a second surface layer including a second electrode and directly bonded to the first substrate so that the second surfac...
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Main Author | |
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Format | Patent |
Language | English |
Published |
04.10.2016
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed herein is a semiconductor device including: a first substrate provided with a first surface layer including a first electrode; an expanded second substrate provided with a second surface layer including a second electrode and directly bonded to the first substrate so that the second surface layer contacts with the first surface layer; and a through electrode running through the first or second substrate. The second surface layer is provided over an expanded second principal surface defined by a second substrate and a resin portion. The second substrate has a smaller planar size than the first substrate. The first and second electrodes are connected together and in contact with each other. |
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Bibliography: | Application Number: US201514948128 |