Protocol for assigning features and tuning resolution in digital lithography
A system and method is used to optimize print parameters in the printing of functional electronic materials and integrated objects. The method employs a grid pattern to determine drop spacing and further assigns priority to various features to be printed, separating features into layers to be printe...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
20.09.2016
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Subjects | |
Online Access | Get full text |
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Summary: | A system and method is used to optimize print parameters in the printing of functional electronic materials and integrated objects. The method employs a grid pattern to determine drop spacing and further assigns priority to various features to be printed, separating features into layers to be printed. The most critical layers being printed with higher resolution and greater accuracy, the less critical layers being printed at lower resolution. |
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Bibliography: | Application Number: US201514873568 |