Method for manufacturing patterned layer and method for manufacturing electrochromic device

A method for manufacturing a patterned layer includes the steps of: providing a substrate having a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface faces the material source; provi...

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Bibliographic Details
Main Authors Tseng Jen-Pei, Lin Ting-Chun, Jhan Ren-Hong, Tu Chun-Hao, Kung Kuo-Sen, Hsieh Hao-Lun
Format Patent
LanguageEnglish
Published 23.08.2016
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Summary:A method for manufacturing a patterned layer includes the steps of: providing a substrate having a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface faces the material source; providing a magnetic element, in which the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface through using the magnetic element so as to form a patterned layer. A method for manufacturing an electrochromic device is disclosed as well.
Bibliography:Application Number: US201414186498