Radiation source, lithographic apparatus and device manufacturing method
A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method i...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
09.08.2016
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Subjects | |
Online Access | Get full text |
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Summary: | A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate. |
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Bibliography: | Application Number: US20090540548 |