Power supplying means having shielding means for feeding line and substrate processing apparatus including the same
A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
19.07.2016
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the source electrode and the RF power source; and a shielding part wrapping the feeding line to block an electric field. |
---|---|
AbstractList | A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the source electrode and the RF power source; and a shielding part wrapping the feeding line to block an electric field. |
Author | JEON BU-IL DO JAEUL SONG MYUNG-GON LEE JUNG-RAK |
Author_xml | – fullname: JEON BU-IL – fullname: SONG MYUNG-GON – fullname: DO JAEUL – fullname: LEE JUNG-RAK |
BookMark | eNqNi70OgkAQhCm08O8d9gVsoFBajcbSRK3JCoNccuxdbg-Nby8QE1uryXwz3zyZiBPMEj27FwJp5719G3lQCxalhp9D0cbAVj9cu0A1MBJrBMRS9e5dY-AI8sGVUB1W9p571ikZKW03GrEBKbdYJtOarWL1zUVCx8N1f1rDuwLquYQgFrdLnuXbTZbu0uyPyweAmEaz |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | US9398732B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US9398732B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 13:04:52 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US9398732B23 |
Notes | Application Number: US201113174529 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160719&DB=EPODOC&CC=US&NR=9398732B2 |
ParticipantIDs | epo_espacenet_US9398732B2 |
PublicationCentury | 2000 |
PublicationDate | 20160719 |
PublicationDateYYYYMMDD | 2016-07-19 |
PublicationDate_xml | – month: 07 year: 2016 text: 20160719 day: 19 |
PublicationDecade | 2010 |
PublicationYear | 2016 |
RelatedCompanies | JEON BU-IL DO JAE-CHUL SONG MYUNG-GON LEE JUNG-RAK JUSUNG ENGINEERING CO., LTD |
RelatedCompanies_xml | – name: SONG MYUNG-GON – name: JEON BU-IL – name: JUSUNG ENGINEERING CO., LTD – name: DO JAE-CHUL – name: LEE JUNG-RAK |
Score | 3.0463238 |
Snippet | A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PRINTED CIRCUITS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | Power supplying means having shielding means for feeding line and substrate processing apparatus including the same |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160719&DB=EPODOC&locale=&CC=US&NR=9398732B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KFfWmVbG-2IPkFjTdmDSHIDQPitAHtpXeSh4bDNg0uAn-fWe2Ly96y-6yS3Zg9puZ3W8G4CHKDLsb25FuGxS6QUDQu6bJdZ5yYVhPUcYFcYcHQ6s_M1_nz_MG5FsujMoT-q2SI6JGJajvlTqvy30Qy1dvK-VjnGPX6iWcur628Y5VtjRH83tuMB75I0_zPHc20YZvrsPRueadHp7WB2hF26QMwXuPSCnlb0QJT-FwjIsV1Rk0RNGCY29beK0FR4PNfTd-blRPnoMcUz0zJqkKJ1GT2FIgyjAi2WNDftBLtH03mqIsWwMTI0OSRUWKc2OVJVewck0PoNGoVNm_a8nyIvms1Qw0CpmMluICWBhMvb6Of7_YSWoxm-z2yS-hWawKcQXM6cRpYjtpIpLMtMnDyiwuhMERnVOrE7eh_ecy1_-M3cAJiZwinYZzC83qqxZ3CNFVfK-E-wNHBpmK |
link.rule.ids | 230,309,783,888,25576,76876 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLamgRg3GCDGMwfUWwVdSrseKqS1mwbsJbah3aY-UlGJdRXpxN_Hzl5c4NYkStRYcj7byWcD3AWJYTdCO9Btg0I3CAh6wzS5zmMuDOshSLgg7nCvb3Um5sv0cVqCdMOFUXlCv1VyRNSoCPW9UOd1vgti-eptpbwPU-xaPLXHrq-tvWOVLc3R_KbbGg78gad5njsZaf031-HoXPN6E0_rPbSwbVKG1nuTSCn5b0RpH8H-EBfLimMoiawKFW9TeK0KB731fTd-rlVPnoAcUj0zJqkKJ1GT2FwgyjAi2WNDftBLtF03mqIsWQETI0OSBVmMc0OVJVewfEUPoNEgV9m_l5KlWfS5VDPQKGQymItTYO3W2Ovo-PezraRmk9F2n_wMytkiE-fAnHoYR7YTRyJKTJs8rMTiQhgc0Tm26mENan8uc_HP2C1UOuNed9Z97r9ewiGJn6KehnMF5eJrKa4RrovwRgn6B6dCnH0 |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Power+supplying+means+having+shielding+means+for+feeding+line+and+substrate+processing+apparatus+including+the+same&rft.inventor=JEON+BU-IL&rft.inventor=SONG+MYUNG-GON&rft.inventor=DO+JAEUL&rft.inventor=LEE+JUNG-RAK&rft.date=2016-07-19&rft.externalDBID=B2&rft.externalDocID=US9398732B2 |