Power supplying means having shielding means for feeding line and substrate processing apparatus including the same
A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
19.07.2016
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Subjects | |
Online Access | Get full text |
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Summary: | A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the source electrode and the RF power source; and a shielding part wrapping the feeding line to block an electric field. |
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Bibliography: | Application Number: US201113174529 |