Electrical resistance measurement apparatus and electrical resistance measurement method

An electrical resistance measurement apparatus includes a light irradiation unit that irradiates a conductive thin film with terahertz light, a reflection light detection unit that detects reflection light from the conductive thin film, and a computer containing a storage that stores correlation bet...

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Bibliographic Details
Main Author HAMANO AKIHIDE
Format Patent
LanguageEnglish
Published 21.06.2016
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
TESTING
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Summary:An electrical resistance measurement apparatus includes a light irradiation unit that irradiates a conductive thin film with terahertz light, a reflection light detection unit that detects reflection light from the conductive thin film, and a computer containing a storage that stores correlation between the reflectance of the terahertz light from the conductive thin film and electrical resistance of the conductive thin film. The computer further containing a processor that determines, reflectance of the terahertz light from the conductive thin film based on a result of detection performed by the reflection light detection unit, and determines the electrical resistance of the conductive thin film based on the correlation and a result of the determination of the reflectance.
Bibliography:Application Number: US201313786825