Semiconductor buffer structure, semiconductor device including the semiconductor buffer structure, and method of manufacturing the semiconductor device using the semiconductor buffer structure

A semiconductor buffer structure includes a silicon substrate, a nucleation layer formed on the silicon substrate, and a buffer layer formed on the nucleation layer. The buffer layer includes a first layer formed of a nitride semiconductor material having a uniform composition rate, a second layer f...

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Bibliographic Details
Main Authors KIM JOO-SUNG, PARK YOUNG-SOO, KIM JAE-KYUN, TAK YOUNG-JO, KIM JUN-YOUN, CHAE SU-HEE
Format Patent
LanguageEnglish
Published 10.05.2016
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Summary:A semiconductor buffer structure includes a silicon substrate, a nucleation layer formed on the silicon substrate, and a buffer layer formed on the nucleation layer. The buffer layer includes a first layer formed of a nitride semiconductor material having a uniform composition rate, a second layer formed of the same material as the nucleation layer on the first layer, and a third layer formed of the same material with the same composition ratio as the first layer on the second layer.
Bibliography:Application Number: US201414484456