Method and apparatus for providing a layout defining a structure to be patterned onto a substrate

A method provides a layout defining a structure to be patterned onto a substrate. The structure is registered with a predefined grid of the layout. The method includes locally stretching the grid in a first portion of a layout causing a problematic spot on the substrate.

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Bibliographic Details
Main Author MELZNER HANNO
Format Patent
LanguageEnglish
Published 16.02.2016
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:A method provides a layout defining a structure to be patterned onto a substrate. The structure is registered with a predefined grid of the layout. The method includes locally stretching the grid in a first portion of a layout causing a problematic spot on the substrate.
Bibliography:Application Number: US201414246934