Methods of singulating substrates to form semiconductor devices using dummy material

In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed.

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Bibliographic Details
Main Authors DENIFL GUENTER, STRANZL GUDRUN, KAHN MARKUS, ZGAGA MARTIN
Format Patent
LanguageEnglish
Published 09.02.2016
Subjects
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Summary:In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed.
Bibliography:Application Number: US201414260903