Methods of singulating substrates to form semiconductor devices using dummy material
In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed.
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
09.02.2016
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Subjects | |
Online Access | Get full text |
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Summary: | In one embodiment, a method of forming a semiconductor device includes forming openings in a substrate. The method includes forming a dummy fill material within the openings and thinning the substrate to expose the dummy fill material. The dummy fill material is removed. |
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Bibliography: | Application Number: US201414260903 |