Measurement of critical dimension and scanner aberration utilizing metrology targets

Metrology targets and method of using the metrology targets for measurement of critical dimension, overlay or scanner aberration are disclosed. A target may include an unresolved grid having a plurality of lines spaced equally apart from each other according to a pre-determined pitch distance and at...

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Main Authors MANASSEN AMNON, LOEVSKY BARRY
Format Patent
LanguageEnglish
Published 09.02.2016
Subjects
CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
TESTING
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Abstract Metrology targets and method of using the metrology targets for measurement of critical dimension, overlay or scanner aberration are disclosed. A target may include an unresolved grid having a plurality of lines spaced equally apart from each other according to a pre-determined pitch distance and at least one resolved feature tilted at an angle with respect to the unresolved grid. The method may indentify multiple regions of interest (ROIs) and determine a series of center points between the ROIs as the ROIs are being shifted. Critical dimension, overlay or scanner aberration may be calculated by analyzing the series of center points between the ROIs.
AbstractList Metrology targets and method of using the metrology targets for measurement of critical dimension, overlay or scanner aberration are disclosed. A target may include an unresolved grid having a plurality of lines spaced equally apart from each other according to a pre-determined pitch distance and at least one resolved feature tilted at an angle with respect to the unresolved grid. The method may indentify multiple regions of interest (ROIs) and determine a series of center points between the ROIs as the ROIs are being shifted. Critical dimension, overlay or scanner aberration may be calculated by analyzing the series of center points between the ROIs.
Author LOEVSKY BARRY
MANASSEN AMNON
Author_xml – fullname: MANASSEN AMNON
– fullname: LOEVSKY BARRY
BookMark eNqNyj0KwkAQQOEttPDvDnMBC5WQ2CqKjZWxDuNmsgxsZsPspNDTq-ABrB58vLmbSBKaufpKmEelnsQgdeCVjT1GaPlDmZMASgvZowgp4INU0b48Gkd-sQToyTTFFJ5gqIEsL920w5hp9evCwflUHy9rGlJDeUBPQtbcb_ttUZRVedjs_lje0_E7ag
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US9255787B1
GroupedDBID EVB
ID FETCH-epo_espacenet_US9255787B13
IEDL.DBID EVB
IngestDate Fri Jul 19 13:10:26 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US9255787B13
Notes Application Number: US201414160217
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160209&DB=EPODOC&CC=US&NR=9255787B1
ParticipantIDs epo_espacenet_US9255787B1
PublicationCentury 2000
PublicationDate 20160209
PublicationDateYYYYMMDD 2016-02-09
PublicationDate_xml – month: 02
  year: 2016
  text: 20160209
  day: 09
PublicationDecade 2010
PublicationYear 2016
RelatedCompanies KLA-TENCOR CORPORATION
RelatedCompanies_xml – name: KLA-TENCOR CORPORATION
Score 3.0174038
Snippet Metrology targets and method of using the metrology targets for measurement of critical dimension, overlay or scanner aberration are disclosed. A target may...
SourceID epo
SourceType Open Access Repository
SubjectTerms CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
TESTING
Title Measurement of critical dimension and scanner aberration utilizing metrology targets
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160209&DB=EPODOC&locale=&CC=US&NR=9255787B1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1bS8MwFD6MeX3Tqjhv5EH6Vlxp17UPReiNIeyC22Rvo2lSKWg72oror_ck6zZf9CWEBEJyki_n5OTLCcA90xNDFzFb0x5PNdOKTY0yq4uIp6zfZYa4MRRsi5E1mJtPi96iBdnmLYyME_opgyMiohLEey3369XOiRVIbmX1QDMsKh6jmRuozelYt9D6cdTAc8PJOBj7qu-786k6enYdNJ1xbXp4UNoTWQGG8MUTj1JWvzVKdAL7E2wsr0-hxXMFjvzNx2sKHA6b-24FDiRBM6mwsAFhdQaz4c6vR4qUJM1vBYSJSP3C-0XinJEKhZbzksSUl-tpJrjI3rJvVFbknQuCevH6RdZU8OocSBTO_IGGHV1uhbKcT7dDMi6gnRc5vwSSUJvbNiZ91jdjQ6fUTNAA6KUpNVOb6h3o_NnM1T9113AspCvpys4NtOvyg9-iNq7pnZTjD3F2ka4
link.rule.ids 230,309,783,888,25576,76882
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3NT8IwFH8h-IE3RY342YPZjciysY_DYrINgsqAyDDcyLp2hkQ3wmaM_vW-lgFe9NLDa9K0r319H_31PYBbpsaaKnK2Jm2eNHUj0puUGS2UeMrMFtPEi6FAWwyM3kR_nLanFZiv_8LIPKGfMjkiSlSM8l7I-3qxDWL5EluZ39E5krL7buj4SukdqwZaP7biu05nNPSHnuJ5zmSsDJ4dG01nPJsuOko7aGFbothB58UVn1IWvzVK9xB2RzhYWhxBhad1qHnrwmt12A_K9-467EmAZpwjsRTC_BjCYBvXI1lC4rJaAWEiU7-IfpEoZSRHpqV8SSLKl6ttJnjI3ubfqKzIOxcA9ez1i6yg4PkJkG4n9HpNnOhsw5TZZLxZknYK1TRL-RmQmFrcsrAxmalHmkqpHqMB0E4SqicWVRvQ-HOY83_6bqDWC4P-rP8weLqAA8FpCV22L6FaLD_4FWrmgl5Lnv4Abt2Ung
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Measurement+of+critical+dimension+and+scanner+aberration+utilizing+metrology+targets&rft.inventor=MANASSEN+AMNON&rft.inventor=LOEVSKY+BARRY&rft.date=2016-02-09&rft.externalDBID=B1&rft.externalDocID=US9255787B1