Methods, structures, and designs for self-aligning local interconnects used in integrated circuits
An integrated circuit includes a gate electrode level region that includes a plurality of linear-shaped conductive structures. Each of the plurality of linear-shaped conductive structures is defined to extend lengthwise in a first direction. Some of the plurality of linear-shaped conductive structur...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
19.01.2016
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Subjects | |
Online Access | Get full text |
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Summary: | An integrated circuit includes a gate electrode level region that includes a plurality of linear-shaped conductive structures. Each of the plurality of linear-shaped conductive structures is defined to extend lengthwise in a first direction. Some of the plurality of linear-shaped conductive structures form one or more gate electrodes of corresponding transistor devices. A local interconnect conductive structure is formed between two of the plurality of linear-shaped conductive structures so as to extend in the first direction along the two of the plurality of linear-shaped conductive structures. |
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Bibliography: | Application Number: US201414188321 |