Solar cells with patterned antireflective surfaces

Systems and methods for producing nanoscale textured low reflectivity surfaces may be utilized to fabricate solar cells. A substrate may be patterned with a resist prior to an etching process that produces a nanoscale texture on the surface of the substrate. Additionally, the substrate may be subjec...

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Bibliographic Details
Main Authors MARGADONNA DANIELE, AHEARN WENDY G, ZUBIL THEODORE, LEVY DAVID H, TOPEL, JR. RICHARD W, FLOOD DENNIS
Format Patent
LanguageEnglish
Published 12.01.2016
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Summary:Systems and methods for producing nanoscale textured low reflectivity surfaces may be utilized to fabricate solar cells. A substrate may be patterned with a resist prior to an etching process that produces a nanoscale texture on the surface of the substrate. Additionally, the substrate may be subjected to a dopant diffusion process. Prior to dopant diffusion, the substrate may be optionally subjected to liquid phase deposition to deposit a material that allows for patterned doping. The order of the nanoscale texture etching and dopant diffusion may be modified as desired to produce post-nano emitters or pre-nano emitters.
Bibliography:Application Number: US201414260687