Device for producing titanium metal, and method for producing titanium metal

A device for producing titanium metal comprises (a) a first heating unit that heats and gasifies magnesium and a first channel that feeds the gaseous magnesium, (b) a second heating unit that heats and gasifies titanium tetrachloride so as to have a temperature of at least 1600° C. and a second chan...

Full description

Saved in:
Bibliographic Details
Main Authors GUO JIAYIN, HAN GANG, BOULOS MAHER I, UESAKA SHUJIROH, JUREWICZ JERZY, SHOJI TATSUYA
Format Patent
LanguageEnglish
Published 20.10.2015
Subjects
BLASTING
CHEMISTRY
DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE
FERROUS OR NON-FERROUS ALLOYS
FURNACES
HEATING
KILNS
LIGHTING
MECHANICAL ENGINEERING
METALLURGY
OVENS
PRETREATMENT OF RAW MATERIALS
PRODUCTION AND REFINING OF METALS
RETORTS
TREATMENT OF ALLOYS OR NON-FERROUS METALS
WEAPONS
Online AccessGet full text

Cover

More Information
Summary:A device for producing titanium metal comprises (a) a first heating unit that heats and gasifies magnesium and a first channel that feeds the gaseous magnesium, (b) a second heating unit that heats and gasifies titanium tetrachloride so as to have a temperature of at least 1600° C. and a second channel that feeds the gaseous titanium tetrachloride, (c) a venturi section at which the second channel communicates with an entrance channel, the first channel merges into a throat and as a result the magnesium and the titanium tetrachloride combine in the throat and a mixed gas is formed in the exit channel, and in which the temperature of the throat and the exit channel is regulated to be at least 1600° C., (d) a titanium metal deposition unit that communicates with the exit channel and has a substrate for deposition with a temperature in the range of 715-1500° C., and (e) a mixed gas discharge channel that communicates with the titanium metal deposition unit.
Bibliography:Application Number: US201113988580