Nonvolatile semiconductor memory device

According to one embodiment, a nonvolatile semiconductor memory device includes fin-type stacked layer structures. Each of the structures includes semiconductor layers stacked in a perpendicular direction. Assist gate electrodes are disposed in an in-plane direction and divided on a surface in the p...

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Bibliographic Details
Main Authors KIYOTOSHI MASAHIRO, KUSAI HARUKA, KINOSHITA ATSUHIRO, SAKUMA KIWAMU
Format Patent
LanguageEnglish
Published 07.07.2015
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Summary:According to one embodiment, a nonvolatile semiconductor memory device includes fin-type stacked layer structures. Each of the structures includes semiconductor layers stacked in a perpendicular direction. Assist gate electrodes are disposed in an in-plane direction and divided on a surface in the perpendicular direction of the structures.
Bibliography:Application Number: US201213547567