System for attachment of an electrode into a plasma source

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form...

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Main Authors PARKER N. WILLIAM, ZHANG SHOUYIN, SCHWIND GREGORY A, SMITH NOEL, SKOCZYLAS WALTER, KELLOGG SEAN, GRAUPERA ANTHONY, UTLAUT MARK W, WELLS ANDREW B
Format Patent
LanguageEnglish
Published 09.06.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Bibliography:Application Number: US201113307830