Projection exposure apparatus for semiconductor lithography including an actuator system
The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
12.05.2015
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system. |
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Bibliography: | Application Number: US201113196239 |