Shield stabilization configuration with applied bias

An apparatus includes a sensor stack, first and second shields positioned on opposite sides of the sensor stack, and a first shield stabilization structure adjacent to the first shield and applying a bias magnetic field to the first shield. A second shield stabilization structure can be positioned a...

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Bibliographic Details
Main Authors QUAN JUNJIE, YI JAE-YOUNG, SINGLETON ERIC WALTER
Format Patent
LanguageEnglish
Published 07.04.2015
Subjects
CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS
CHEMISTRY
ELECTRICITY
FERROUS OR NON-FERROUS ALLOYS
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
METALLURGY
PHYSICS
TESTING
TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Summary:An apparatus includes a sensor stack, first and second shields positioned on opposite sides of the sensor stack, and a first shield stabilization structure adjacent to the first shield and applying a bias magnetic field to the first shield. A second shield stabilization structure can be positioned adjacent to the second shield.
Bibliography:Application Number: US201314109184