Stress liner for stress engineering

A stress liner having first and second stress type is provided over a first type and a second type transistor to improve reliability and performance without incurring area penalties or layout deficiencies.

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Bibliographic Details
Main Authors LEE JAE GON, LU WEI, TIAN JINGZE, GOH LUONA, QUEK ELGIN, TAN SHYUE SENG
Format Patent
LanguageEnglish
Published 07.04.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A stress liner having first and second stress type is provided over a first type and a second type transistor to improve reliability and performance without incurring area penalties or layout deficiencies.
Bibliography:Application Number: US20080133375