Optoelectronic device and method for manufacturing the same

A method of fabricating an optoelectronic device, comprising: providing a substrate, wherein the substrate comprises a first major surface and a second major surface opposite to the first major surface; forming a light emitting stack on the second major surface of the substrate; forming a supporting...

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Bibliographic Details
Main Authors FANG PEI SHAN, CHEN BIAU-DAR, CHEN CHUN CHANG, HO CHENG HSIANG, CHI LIANG SHENG
Format Patent
LanguageEnglish
Published 24.03.2015
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Summary:A method of fabricating an optoelectronic device, comprising: providing a substrate, wherein the substrate comprises a first major surface and a second major surface opposite to the first major surface; forming a light emitting stack on the second major surface of the substrate; forming a supporting layer covering the light emitting stack; forming a plurality of first modified regions in the substrate by employing a first energy into the substrate, wherein the supporting layer is formed before forming the plurality of first modified regions; forming an oxide layer on the first major surface of the substrate; and cleaving the substrate along the plurality of first modified regions.
Bibliography:Application Number: US201313896570