Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liq...

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Bibliographic Details
Main Authors WANTEN PETER FRANCISCUS, JANSEN HANS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, JANSEN BAUKE, BEEREN RAYMOND GERARDUS MARIUS, HOEKERD KORNELIS TIJMEN, CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS, STAVENGA MARCO KOERT
Format Patent
LanguageEnglish
Published 03.02.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
Bibliography:Application Number: US20080081169