Substrate plasma-processing apparatus

A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrat...

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Bibliographic Details
Main Authors KANG TAE-WOOK, PARK JAE-MORK, JI CHANG-SOON, AN CHENG-GUO, CHO HYUN-LAE, LEE JEONG-YEOL, KIM OU-HYEN
Format Patent
LanguageEnglish
Published 02.12.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.
Bibliography:Application Number: US201313972497