Chemical vapor deposition of fluorocarbon polymers

• Main Authors: ZHUK ANDREW VLADIMIROVICH, SONNENBERG NEVILLE
• Format: Patent
• Language: English
• Published: 18.11.2014
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed. The structure surface is maintained at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.