Lithographic apparatus and device manufacturing method
A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into...
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Main Author | |
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Format | Patent |
Language | English |
Published |
11.11.2014
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Subjects | |
Online Access | Get full text |
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Summary: | A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold. |
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Bibliography: | Application Number: US201113044358 |