Illumination system for a microlithgraphic exposure apparatus

An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an...

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Main Authors FUERTER GERHARD, DODOC AURELIAN, ULRICH WILHELM, EGGER RAFAEL, MOEGELE ARTUR, RAUM MICHAEL, FELDMANN HEIKO, SOHMER ALEXANDER
Format Patent
LanguageEnglish
Published 28.10.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
AbstractList An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
Author SOHMER ALEXANDER
FUERTER GERHARD
FELDMANN HEIKO
EGGER RAFAEL
MOEGELE ARTUR
RAUM MICHAEL
DODOC AURELIAN
ULRICH WILHELM
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FUERTER GERHARD
CARL ZEISS SMT GMBH
FELDMANN HEIKO
EGGER RAFAEL
MOEGELE ARTUR
RAUM MICHAEL
DODOC AURELIAN
ULRICH WILHELM
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Snippet An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Illumination system for a microlithgraphic exposure apparatus
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