Illumination system for a microlithgraphic exposure apparatus
An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English |
Published |
28.10.2014
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Subjects | |
Online Access | Get full text |
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Summary: | An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser. |
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Bibliography: | Application Number: US20060911904 |